Atomic layer deposition: Catalytic preparation and modification technique for the next generation

doi:10.1016/S1872-2067(19)63321-8

Abstract

Abstract: Atomic layer deposition (ALD) attracts great attention nowadays due to its ability for designing and modifying catalytic systems at the molecular level. There are several reported review papers published recently discussing this technique in catalysis. However, the mechanism on how the deposited materials improve the catalyst stability and tune the reaction selectivity is still unclear. Herein, catalytic systems created via ALD on stepwise preparation and/or modification under self-limiting reaction conditions are summarized. The effects of deposited materials in terms of electronic/geometry modification over the catalytic nanoparticles (NPs) are discussed. These effects explain the mechanism of the catalytic stability improvement and the selectivity modification. The unique properties of ALD for designing new catalytic systems are further investigated for building up photocatalytic reaction nanobowls, tandem catalyst and bi-active-component metallic catalytic systems.

Key words: Atomic layer deposition, Catalyst modification, Catalyst preparation, Redox properties, Terrace site, Step site

Hongbo Zhang, Christopher L. Marshall. Atomic layer deposition: Catalytic preparation and modification technique for the next generation[J]. Chinese Journal of Catalysis, 2019, 40(9): 1311-1323.

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URL: https://www.cjcatal.com/EN/10.1016/S1872-2067(19)63321-8

https://www.cjcatal.com/EN/Y2019/V40/I9/1311

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